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Atomic force microscopes (AFMs) are instruments that allow three-dimensional imaging of surfaces with nanometer resolution. Also used to determine chemical and mechanical properties of surfaces, they and their cousins, collectively called scanning probe microscopes, are the principal enabling technologies in the fields of nanoscience and engineering. Nanoscience and engineering encompass many different disciplines, e.g. physics, chemistry, materials science, electrical engineering, and biology. Their common thread is the mutual focus on understanding, designing, and controlling processes and devices at the nanoscale.
If you complete this course, you will understand the functional principles of AFMs, be able to run one, and interpret the data that you collect. The course has two main parts. The first half of the semester emphasizes instrumentation, the second half interpretation. A bachelor's degree in science or engineering is sufficient background. Previous students have indicated that the course was not only helpful to their research, but also in finding employment. You must pass the course in order to use the AFM in your future research. Auditors are welcome to sit in the lectures. However, they may not partake in the labs due to the high cost of supplies, the limited number of TAs, and licensing issues.
AFM | Grading
| Syllabus | Calendar
| Objectives | Materials
| Reading and
presentation | Labs | Communication and dates
| Type of Assignment |
# x % (Min.Words) |
| The six instrument lab reports |
3 x 4 % (400) 2 x 8 % (800) 1 x 12 % (1200) |
| The two exams | 2 x 10 % |
| The six computer lab reports | 10 % (200) |
| Your lecture |
10 % |
| Abstract and presentation | 10 % |
| Responsibility, timeliness, cooperation |
10 % |
PART I – INSTRUMENTATION
Unit 1, Fundamentals of imaging
PART II – INTERPRETATIONClass 1: IntroductionUnit 2, Difficulties of imaging
Class 2: SPM and AFM instrumentation
IL1: Laboratory procedures
CL1: Image processing
IL2: Acquiring an image
Class 3: Feedback and artifactsUnit 3, Other SPMs and operational modes
Class 4: Perturbations and noise
Class 5: Fast fourier transforms
IL3: Optimizing an image and lateral force microscopy
CL2: Feedback and noise
CL3: Fast fourier transforms
Class 6: Scanning tunneling microscopyUnit 4, Calibration
Class 7: Lateral force microscopy
Class 8: Operational modes
IL3: Optimizing an image and lateral force microscopy
Class 9: Probe calibrationClass 13: Exam 1 on instrumentation
Class 10: Scanner calibration
IL4: Probe and scanner calibration
Unit 5, Force-curve mechanics
Class 11: Potentials, forces, and stiffnesses
Class 12: Force curves
IL5: Acquiring and processing force curves
CL4: Potentials, forces, and stiffnesses
CL5: Compliance
Unit 6, Tip-sample interactions
Class 14: Surface forces
Class 15: Basic mechanical properties
Class 16: Contact mechanics
Class 19: Energy dissipation and molecular dynamics
IL6: Contact mechanics
CL6: Contact mechanics
CL7: Molecular dynamics
Unit 7, A glimpse at current researchClass 17: Student presentations on current researchClass 20: Review
Class 18: Student presentations on current research
Class 21: Exam 2 on interpretation
|
Week |
Date |
Topic |
Lecturer
9-10:00 |
Grp1,
10-12:00 |
Grp2,
10-12:00 |
OffHr
11-12:00 |
Due |
|
|
|
|
|
(Students
1,3,5) |
(Students
2,4,6) |
|
|
|
1 |
14-Jan |
Introduction |
NAB |
IL1 |
CL1 |
Open |
– |
|
2 |
21-Jan |
Feedback
and artifacts |
NAB |
CL1 |
IL1 |
1. Saonti Charkraborty |
– |
|
3 |
28-Jan |
Noise and FFTs |
1. Saonti Charkraborty |
IL2 |
CL2 |
2. Lisa Lee |
CL1, IL1 |
|
4 |
4-Feb |
Calibration |
2. Lisa Lee |
CL2 |
IL2 |
3. Nihar Pradhan |
– |
|
5 |
11-Feb |
STM, LFM |
3. Nihar Pradhan |
IL3 |
CL3 |
4. Paola Pinzon-Arango |
CL2, IL2 |
|
6 |
18-Feb |
Other
SPMs and modes |
4. Paola Pinzon-Arango |
CL3 |
IL3 |
5. Anusha Pokhriyal |
– |
|
7 |
25-Feb |
UFk,
force curves |
5. Anusha Pokhriyal |
IL4 |
CL4 |
6. Jason Cox |
CL3, IL3 |
|
– |
3-Mar |
– |
– |
– |
|
– |
– |
|
8 |
10-Mar |
Surface
forces |
6. Jason Cox |
CL4 |
IL4 |
Open |
Topic |
|
9 |
17-Mar |
Exam 1 |
– |
IL5 |
CL5 |
Open |
CL4, IL4 |
|
10 |
24-Mar |
Mechanical
properties |
NAB |
CL5 |
IL5 |
Open |
3 Papers |
|
11 |
31-Mar |
Contact
mechanics |
NAB |
IL6 |
CL6 |
Open |
CL5, IL5 |
|
12 |
7-Apr |
Molecular
dynamics |
NAB |
CL6 |
IL6 |
Open |
Abstract |
|
13 |
14-Apr |
Exam 2 |
– |
If
unavoidable, make-ups |
Open |
CL6, IL6 |
|
|
14 |
21-Apr |
20-min. presentations by all
students, 9:00-12:00 |
Presentation |
||||
Unit 1, Fundamentals of imaging
1a. Describe the differences
among SPM, SXM, STM, AFM, SFM, LFM, and FFM. (PG Sects.1.0,
1.1)
1b. Know in which environments
an SPM can operate. (PG Sect.1.7)
1c. Sketch diagrams showing the
difference between constant-height and constant-strength modes. (PG
Sects.1.0, 1.1)
1d. State the advantages and disadvantages of AFM and the ways in
which AFM can be used. (IntroAFM)
1e. Distinguish between the "top-down" and "bottom-up" approaches
to nanotechnology. (IntroNST)
1f. Know the effects of the basic
image-processing options. (SPMLab, CL1)
1g. Describe how to acquire and process a
contact-mode
constant-normal-force AFM image. (PG Chap.5, UGI Chaps.
1-3, IL1, IL2)
Unit 2, Difficulties of imaging
2a. Describe how a feedback
circuit
works and how you can control it. (UGI
Chap.4, FB, CL2)
2b. Know how to optimize an image.
(UGI Chap.4, IL3)
2c. Know how to test for artifacts. (PG
Chap.4, UGI Chap.4)
2d. Identify common artifacts and be
able to rectify them. (PG Chap.4, UGI
Chap.4)
2e. Identify the four most important
types of noise and specify their characteristics. (DraftSect2.2,
CL2
)
2f. Know how SPMs are built, situated,
and protected so
as to limit perturbations. (DraftSect.2.2)
2g. Explain the principles of fourier theory and fourier
threshold filtering. (DraftSect2.2, CL3)
2h. Be able to improve
SPM images using fourier threshold filtering. (CL3)
Unit 3, Other SPMs and
operational
modes
Unit 4, Calibration
Unit 5, Force-curve mechanics
5a. Calculate all the
relationships
among potentials,
forces, and concavity. (DraftSect4.1, CL4)
5b. Understand the origins of cantilever
instabilities. (DraftSect4.1, CL5)
5c. Understand why and how raw force-curve data is converted
into processed data. (DraftSect4.1)
5d. List the advantages and disadvantages of weak and
stiff cantilevers. (DraftSect4.1)
Unit 6, Tip-sample interactions
Unit 7, A glimpse at current research
7a. Give some examples of current
research topics. (student presentations)
7b. Know how SPMs have contributed
to this research. (student presentations)
| Reading materials |
Lab materials |
| DraftSect2.2,
Combating Unwanted Perturbations DraftSect4.1, Force Curves FB, Feedback System Response in a Scanning Tunneling Microscope FFM, Friction Force Microscopy HLI, Looking at Atoms HLII, Stroking Molecules IntroAFM, Poster introducing AFM IntroNST, Poster introducing nanoscience and technology MPM, Mechanical Properties of Metals PG, A Practical Guide to Scanning Probe Microscopy SFA, Surface Forces and Adhesion StiffCal, Stiffness calibration paper STM, Scanning Tunneling Microscopy PH2510, Atomic Force Microscopy |
CLI,
Computer Lab Instructions Data Dlevers.pdf, Data sheet for stiff cantilevers Data gratings, Data sheet for calibration gratings Data Ultralevers.pdf, Data sheet for compliant cantilevers EXP, Expectations of AFM Users ICA, I.C.Adams manual * ILI, Instrument Lab Instructions ILR, Template for Instrument Lab Reports Lab5, Excel file for Lab 5 report Lab6, Excel file for Lab 6 report LP, Laboratory Procedures SPMLab, Image Analysis Menu Items (Chaps 4-6) * UGI, User's Guide for the M5 Instrument, Part I (Chaps 1-4) * UGII, User's Guide for the M5 Instrument, Part II (Chapter 4) * * The asterix indicates that the document is long and might not be worth printing. |
I will post your weekly reading here:
| Date |
Reading | Objectives |
| For 21 Jan: |
Syllabus; PG Intro; PG Sections 1.0,
1.1, 1.7; PG Chapter 5, IntroAFM, IntroNST, PH2510, LP, EXP | 1a-e |
| For 28 Jan: |
PG Chapter 4, UGI Chapter 4, FB | 1f-2d |
| For 4 Feb: |
DraftSect2.2 | 2e-2g |
| For 11 Feb: |
PG Chaps 2 and 3, StiffCal | 4a-4e |
| For 18 Feb: |
HLI, HLII, STM, FFM | 3a-3c |
| For 25 Feb: |
PG Sects. 1.2-1.6 | 2h, 3d, 3e |
| For 10 Mar: |
Draft Sect. 4.1 | 5a-5d |
| For 17 Mar: |
SFA Sects. 1-3 EXAM 1 | 6a-6c |
| For 24 Mar: |
-- | -- |
| For 31 Mar: |
MPM | 6e |
| For 7 Apr: |
SFA Sects. 4.0-4.2 | 6d, 6f, 6g |
| For 14 Apr: |
SFA Sects. 4.3-5.2 EXAM 2 | 6g, 6h |
| For 21 Apr: |
-- PRESENTATIONS | -- |
Labs are worth 50 % of your final grade. You will work in teams of two on the instrument, but you will submit individual instrument lab reports. You will work individually on the computer labs and submit individual computer lab reports. All lab reports and prelabs are to be on paper; electronic versions will be accepted with a 20 % penalty. Instrument lab reports should use the template provided in the Study Materials section, and figures should be on separate sheets of paper, stapled to the back of the reports. Find out what to do in the Computer Lab Instructions and Instrument Lab Instructions respectively.
I will answer
questions concerning
the self-paced computer labs during our regularly scheduled sessions. If you miss a session, no help will be given
to
you and your lab report will be expected to be of the same quality as
if
you had attended. It is also due at the regularly scheduled time. No
late
reports will be accepted. Any of the almost four-hundred public
computers on campus offers the course software.
The first three instrument labs are for you to learn how to take a good image and are each worth 4 % of your final grade. The fourth concerns calibration, the fifth how to acquire and process a force curve. These are each worth 8 % of your final grade. After learning the basics in the first five labs, the capstone experience is the experiment in the sixth lab where you will take a high-quality image, then acquire and interpret a force curve after calibrating the probe's tip and spring constant. This last lab report is worth 12 % of your final grade. If you have a question about the labs as you write your reports, see me, or talk to Dr Deli Liu, deli@wpi.edu, OH 220, X-5391, who is my postdoc.
You must pass EACH of the six instrument labs in order to pass the course. If you have an important appointment or religious observance that conflicts with your regularly scheduled lab session, you may switch lab times with a classmate, but you must inform me by email at least a day in advance. If unavoidable, lab make-ups will be held the last full week of the term. If you fail to comply with the laboratory procedures, you will not be permitted to use the lab; you will not pass the course.